Date & Venue Friday, 31 August 2018, 10:30AM EF122 Abstract Lithography is the process of selectively exposing optically sensitive materials during semiconductor fabrication. One issue with standard projection lithography is the high cost of infrastructure and mask sets. These costs may be prohibitively expensive for prototyping and low-volume production. Scanning-beam lithography methods are attractive alternatives [...]
Date & Venue Thursday, 16 August 2018, 02:00PM EF122 Abstract Machine learning is currently a hot research area which also is getting a lot of attention in the media. Many are talking about artificial intelligence and how automation will change the world and put people out of work. As a community, machine learning is built [...]
Date & Venue Tuesday, 17 July 2018, 02:00PM EF122 Abstract Understanding the interactions of matter at nano-scale has become the key for the success of several applications. In nanoelectronics or semiconductor industry, it helps for better manufacturing (higher resolution towards sub-10 nm structures, more complex structures) and reliable nanometrology and nano-inspection (for improving the yield [...]
Date & Venue Friday, 06 July 2018, 01:00PM EF122 Abstract This article proposes a novel technique for independent measurement of strain and temperature in piezoresistive strain sensors congured in a tee-rosette. The most notable property of piezoresistive sensors is their easy integration into MEMS fabrication processes and nanopositioning systems, which makes them highly advantageous for [...]
Date & Venue Tuesday, 03 July 2018, 02:00PM EF122 Abstract Atomic force microscope cantilevers with integrated actuation and sensing on the chip level provide several distinct advantages over conventional cantilever instrumentation. These include clean frequency responses, the possibility of down-scaling and parallelization to cantilever arrays as well as the absence of optical interferences. However, the [...]
Date & Venue Tuesday, 26 June 2018, 02:00PM EF122 Abstract This talk presents a novel cantilever design approach to place higher mode frequencies within a specific frequency band to alleviate instrumentation and Q control feasibility. This work is motivated by the emerging field of multifrequency atomic force microscopy which involves the excitation and/or detection of [...]
Date & Venue Tuesday, 12 June 2018, 01:00PM EAG01 Abstract The current, least square (LS) based, method for displacement estimation was introduced 40 years ago. Today, computational power is much more readily available, which has opened up for the possibly employ novel and more advanced methods such as particle filtering. These methods may offer estimates [...]
This article presents a new method for abitrary placement of higher eigenmodes of cantilevers for atomic force microscopy. The article is among 4 finalists for the best conference paper award at the International Conference on Manipulation, Automation and Robotics at Small Scales which will be held in Nagoya, Japan on the 4th to 8th of [...]
