Contact Details

Ben Routley

Precision Mechatronics Lab
School of Electrical Engineering and Computer Science
The University of Newcastle
Callaghan, NSW 2308, Australia
+61 2 4921 7463

Ben(dot)Routley(at)newcastle.edu.au

Biography

Ben Routley is a research assistant with the School of Electrical Engineering and Computer Science at The University of Newcastle, with a specialization in Near-field optics. He is interested in probe based lithography and computer modelling. Currently he is completing a PhD with the School of Mathematical and Physical Sciences with a specialization in Organic Photo-voltaic devices.

Publications

2020

15.Overcoming the Limitations of Tip Enhanced Raman Spectroscopy with Intermittent Contact AFM

A. J. Fleming; M. G. Ruppert; B. S. Routley; L. McCourt

Overcoming the Limitations of Tip Enhanced Raman Spectroscopy with Intermittent Contact AFM Conference

8th Multifrequency AFM Conference, Madrid, Spain, 2020.

Abstract | BibTeX

14.A comparison of gold and silver nanocones and geometry optimisation for tip-enhanced microscopy

L. McCourt; M. G. Ruppert; B. S. Routley; S. Indirathankam; A. J. Fleming

A comparison of gold and silver nanocones and geometry optimisation for tip-enhanced microscopy Journal Article

Journal of Raman Spectroscopy, pp. 1-9, 2020.

Abstract | Links | BibTeX

2019

13.Resolution and Enhancement of Probes for Tip Enhanced Raman Spectroscopy

L. McCourt; B. S. Routley; M. G. Ruppert; A. J. Fleming

Resolution and Enhancement of Probes for Tip Enhanced Raman Spectroscopy Conference

International Conference on Nanophotonics and Micro/Nano Optics (NANOP), Munich, Germany, 2019.

Abstract | BibTeX

12.Scanning Laser Lithography with Constrained Quadratic Exposure Optimization

A. J. Fleming; O. T. Ghalehbeygi; B. S. Routley; A. G. Wills

Scanning Laser Lithography with Constrained Quadratic Exposure Optimization Journal Article

IEEE Transactions on Control Systems Technology, 27 (5), pp. 2221-2228, 2019, ISBN: 1063-6536.

Abstract | Links | BibTeX

11.Model-based Q Factor Control for Photothermally Excited Microcantilevers

M. G. Ruppert; B. S. Routley; A. J. Fleming; Y. K. Yong; G. E. Fantner

Model-based Q Factor Control for Photothermally Excited Microcantilevers Inproceedings

Int. Conference on Manipulation, Automation and Robotics at Small Scales (MARSS), Helsinki, Finland, 2019, ISSN: 978-1-7281-0948-0.

Abstract | Links | BibTeX

2018

10.Independent Estimation of Temperature and Strain in Tee-Rosette Piezoresistive Strain Sensor

M. Omidbeike; B. S. Routley; A. J. Fleming

Independent Estimation of Temperature and Strain in Tee-Rosette Piezoresistive Strain Sensor Inproceedings

IEEE International Conference on Advanced Intelligent Mechatronics, Auckland, New Zealand, 2018.

Abstract | Links | BibTeX

9.Iterative Deconvolution for Exposure Planning in Scanning Laser Lithography

O. T. Ghalehbeygi; J. O'Connor; B. S. Routley; A. J. Fleming

Iterative Deconvolution for Exposure Planning in Scanning Laser Lithography Inproceedings

American Control Conference, Milwaukee, WI, 2018.

Abstract | Links | BibTeX

2017

8.Gradient-based optimization for efficient exposure planning in maskless lithography

O. T. Ghalehbeygi; A. G. Wills; B. S. Routley; A. J. Fleming

Gradient-based optimization for efficient exposure planning in maskless lithography Journal Article

Journal of Micro/Nanolithography, MEMS, and MOEMS, 16 (3), pp. 033507, 2017.

Abstract | Links | BibTeX

7.Modelling and Control of Nitrogen Partial Pressure for Prophylaxis and Treatment of Air Embolism

B. S. Routley; F. Miteff; A. J. Fleming

Modelling and Control of Nitrogen Partial Pressure for Prophylaxis and Treatment of Air Embolism Inproceedings

American Control Conference, Seattle, WA, 2017.

Links | BibTeX

2016

6.Exposure Optimization in Scanning Laser Lithography

A. J. Fleming; A. G. Wills; B. S. Routley

Exposure Optimization in Scanning Laser Lithography Journal Article

IEEE Potentials, 35 (4), pp. 33-39, 2016, ISSN: 0278-6648.

Links | BibTeX

5.A Nonlinear Programming Approach to Exposure Optimization in Scanning Laser Lithography

A. J. Fleming; A. G. Wills; O. T. Ghalehbeygi; B. S. Routley; B. Ninness

A Nonlinear Programming Approach to Exposure Optimization in Scanning Laser Lithography Inproceedings

American Control Conference, Boston, MA, 2016.

BibTeX

4.High Sensitivity Interferometer for on-Axis Detection of AFM Cantilever Deflection

B. S. Routley; A. J. Fleming

High Sensitivity Interferometer for on-Axis Detection of AFM Cantilever Deflection Inproceedings

International Conference on Manipulation, Automation and Robotics at Small Scales, Paris, France, 2016.

Abstract | BibTeX

2015

3.A Closed-Loop Phase-Locked Interferometer for Wide Bandwidth Position Sensing

A. J. Fleming; B. S. Routley

A Closed-Loop Phase-Locked Interferometer for Wide Bandwidth Position Sensing Journal Article

Review of Scientific Instruments, 86 , pp. 115001(1-7), 2015.

Abstract | Links | BibTeX

2.A Closed-Loop Phase-Locked Interferometer for Wide Bandwidth Position Sensing

A. J. Fleming; B. S. Routley; J. L. Holdsworth

A Closed-Loop Phase-Locked Interferometer for Wide Bandwidth Position Sensing Inproceedings

IEEE Multi-conference on Systems and Control, Sydney, 2015.

BibTeX

1.Optimization of near-field scanning optical lithography

B. S. Routley; J. L. Holdsworth; A. J. Fleming

Optimization of near-field scanning optical lithography Inproceedings

Proc. SPIE Advanced Lithography, San Jose, CA, 2015.

Links | BibTeX