Contact Details

Ben Routley

Precision Mechatronics Lab
School of Electrical Engineering and Computer Science
The University of Newcastle
Callaghan, NSW 2308, Australia
+61 2 4921 7463

Ben(dot)Routley(at)newcastle.edu.au

Biography

Ben Routley is a research assistant with the School of Electrical Engineering and Computer Science at The University of Newcastle, with a specialization in Near-field optics. He is interested in probe based lithography and computer modelling. Currently he is completing a PhD with the School of Mathematical and Physical Sciences with a specialization in Organic Photo-voltaic devices.

Publications

2018

10.Independent Estimation of Temperature and Strain in Tee-Rosette Piezoresistive Strain Sensor

M. Omidbeike, B. S. Routley, A. J. Fleming

Independent Estimation of Temperature and Strain in Tee-Rosette Piezoresistive Strain Sensor (Inproceeding)

IEEE International Conference on Advanced Intelligent Mechatronics, Auckland, New Zealand, 2018.

(Abstract | BibTeX)

9.Iterative Deconvolution for Exposure Planning in Scanning Laser Lithography

O. T. Ghalehbeygi, J. O'Connor, B. S. Routley, A. J. Fleming

Iterative Deconvolution for Exposure Planning in Scanning Laser Lithography (Inproceeding)

American Control Conference, Milwaukee, WI, 2018.

(Abstract | BibTeX)

2017

8.Gradient-based optimization for efficient exposure planning in maskless lithography

O. T. Ghalehbeygi, A. G. Wills, B. S. Routley, A. J. Fleming

Gradient-based optimization for efficient exposure planning in maskless lithography (Journal Article)

Journal of Micro/Nanolithography, MEMS, and MOEMS, 16 (3), pp. 033507, 2017.

(Abstract | Links | BibTeX)

7.Modelling and Control of Nitrogen Partial Pressure for Prophylaxis and Treatment of Air Embolism

B. S. Routley, F. Miteff, A. J. Fleming

Modelling and Control of Nitrogen Partial Pressure for Prophylaxis and Treatment of Air Embolism (Inproceeding)

American Control Conference, Seattle, WA, 2017.

(Links | BibTeX)

2016

6.Exposure Optimization in Scanning Laser Lithography

A. J. Fleming, A. G. Wills, B. S. Routley

Exposure Optimization in Scanning Laser Lithography (Journal Article)

IEEE Potentials, 35 (4), pp. 33-39, 2016, ISSN: 0278-6648.

(Links | BibTeX)

5.A Nonlinear Programming Approach to Exposure Optimization in Scanning Laser Lithography

A. J. Fleming, A. G. Wills, O. T. Ghalehbeygi, B. S. Routley, B. Ninness

A Nonlinear Programming Approach to Exposure Optimization in Scanning Laser Lithography (Inproceeding)

American Control Conference, Boston, MA, 2016.

(BibTeX)

4.High Sensitivity Interferometer for on-Axis Detection of AFM Cantilever Deflection

B. S. Routley, A. J. Fleming

High Sensitivity Interferometer for on-Axis Detection of AFM Cantilever Deflection (Inproceeding)

International Conference on Manipulation, Automation and Robotics at Small Scales, Paris, France, 2016.

(Abstract | BibTeX)

2015

3.A Closed-Loop Phase-Locked Interferometer for Wide Bandwidth Position Sensing

A. J. Fleming, B. S. Routley

A Closed-Loop Phase-Locked Interferometer for Wide Bandwidth Position Sensing (Journal Article)

Review of Scientific Instruments, 86 , pp. 115001(1-7), 2015.

(Abstract | Links | BibTeX)

2.A Closed-Loop Phase-Locked Interferometer for Wide Bandwidth Position Sensing

A. J. Fleming, B. S. Routley, J. L. Holdsworth

A Closed-Loop Phase-Locked Interferometer for Wide Bandwidth Position Sensing (Inproceeding)

IEEE Multi-conference on Systems and Control, Sydney, 2015.

(BibTeX)

1.Optimization of near-field scanning optical lithography

B. S. Routley, J. L. Holdsworth, A. J. Fleming

Optimization of near-field scanning optical lithography (Inproceeding)

Proc. SPIE Advanced Lithography, San Jose, CA, 2015.

(Links | BibTeX)