Omid Tayefeh Ghalehbeygi received his bachelor degree in electrical engineering from Urmia University, Iran in 2008. He received his M.Sc degree in electrical and telecommunication from Istanbul Technical University (ITU), Turkey in 2013, which was collaborated with the Universite Catholique de Louvain (UCL), Belgium. Mr Ghalebeygi is interested in probe-based lithography and computer modelling and optimisation. Currently, He is completing a PhD with the School of Electrical Engineering and Computing with a specialisation in scan-based and near-field lithography.
IEEE Transactions on Control Systems Technology, 27 (5), pp. 2221-2228, 2019, ISBN: 1063-6536.
Iterative Deconvolution for Exposure Planning in Scanning Laser Lithography Inproceedings
American Control Conference, Milwaukee, WI, 2018.
Journal of Micro/Nanolithography, MEMS, and MOEMS, 16 (3), pp. 033507, 2017.
A Nonlinear Programming Approach to Exposure Optimization in Scanning Laser Lithography Inproceedings
American Control Conference, Boston, MA, 2016.
Optimization and Simulation of Exposure Pattern for Scanning Laser Lithography Inproceedings
IEEE Multiconference on Systems and Control, Sydney, 2015.