5. |  | A. J. Fleming; O. T. Ghalehbeygi; B. S. Routley; A. G. Wills Scanning Laser Lithography with Constrained Quadratic Exposure Optimization Journal Article IEEE Transactions on Control Systems Technology, 27 (5), pp. 2221-2228, 2019, ISBN: 1063-6536. Abstract | Links | BibTeX @article{J19e,
title = {Scanning Laser Lithography with Constrained Quadratic Exposure Optimization},
author = {A. J. Fleming and O. T. Ghalehbeygi and B. S. Routley and A. G. Wills},
url = {http://www.precisionmechatronicslab.com/wp-content/uploads/2020/02/J19e.pdf},
doi = {10.1109/TCST.2018.2836910},
isbn = {1063-6536},
year = {2019},
date = {2019-09-01},
journal = {IEEE Transactions on Control Systems Technology},
volume = {27},
number = {5},
pages = {2221-2228},
abstract = {Scanning laser lithography is a maskless lithography method for selectively exposing features on a film of photoresist. A set of exposure positions and beam energies are required to optimally reproduce the desired feature pattern. The task of determining the exposure energies is inherently non-linear due to the photoresist model and the requirement for only positive energy. In this article, a nonlinear programming approach is employed to find an optimal exposure profile that minimizes the feature error and total exposure energy. This method is demonstrated experimentally to create a features with sub-wavelength geometry.},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
Scanning laser lithography is a maskless lithography method for selectively exposing features on a film of photoresist. A set of exposure positions and beam energies are required to optimally reproduce the desired feature pattern. The task of determining the exposure energies is inherently non-linear due to the photoresist model and the requirement for only positive energy. In this article, a nonlinear programming approach is employed to find an optimal exposure profile that minimizes the feature error and total exposure energy. This method is demonstrated experimentally to create a features with sub-wavelength geometry. |
4. |  | O. T. Ghalehbeygi; J. O'Connor; B. S. Routley; A. J. Fleming Iterative Deconvolution for Exposure Planning in Scanning Laser Lithography Inproceedings American Control Conference, Milwaukee, WI, 2018. Abstract | BibTeX @inproceedings{C18c,
title = {Iterative Deconvolution for Exposure Planning in Scanning Laser Lithography},
author = {O. T. Ghalehbeygi and J. O'Connor and B. S. Routley and A. J. Fleming},
year = {2018},
date = {2018-06-27},
booktitle = {American Control Conference},
address = {Milwaukee, WI},
abstract = {Laser scanning lithography is a maskless method for exposing photoresist during semiconductor manufacturing. In this method, the power of a focused beam is modulated while scanning the photoresist. This article describes an iterative deconvolution method for determining the exposure pattern. This approach is computationally efficient as there is no gradient calculation. Simulations demonstrate the accurate fabrication of a feature with sub-wavelength geometry.},
keywords = {},
pubstate = {published},
tppubtype = {inproceedings}
}
Laser scanning lithography is a maskless method for exposing photoresist during semiconductor manufacturing. In this method, the power of a focused beam is modulated while scanning the photoresist. This article describes an iterative deconvolution method for determining the exposure pattern. This approach is computationally efficient as there is no gradient calculation. Simulations demonstrate the accurate fabrication of a feature with sub-wavelength geometry. |
3. |  | O. T. Ghalehbeygi; A. G. Wills; B. S. Routley; A. J. Fleming Gradient-based optimization for efficient exposure planning in maskless lithography Journal Article Journal of Micro/Nanolithography, MEMS, and MOEMS, 16 (3), pp. 033507, 2017. Abstract | Links | BibTeX @article{J17j,
title = {Gradient-based optimization for efficient exposure planning in maskless lithography},
author = {O. T. Ghalehbeygi and A. G. Wills and B. S. Routley and A. J. Fleming},
url = {http://www.precisionmechatronicslab.com/wp-content/uploads/2017/09/J17j.pdf},
doi = {10.1117/1.JMM.16.3.033507},
year = {2017},
date = {2017-09-01},
journal = {Journal of Micro/Nanolithography, MEMS, and MOEMS},
volume = {16},
number = {3},
pages = {033507},
abstract = {Scanning laser lithography is a maskless method for exposing photoresist during semiconductor manufacturing. In this method, the energy of a focused beam is controlled while scanning the beam or substrate. With a positive photoresist material, areas that receive an exposure dosage over the threshold energy are dissolved during development. The surface dosage is related to the exposure profile by a convolution and nonlinear function, so the optimal exposure profile is nontrivial. A gradient-based optimization method for determining an optimal exposure profile, given the desired pattern and models of the beam profile and photochemistry, is described. This approach is more numerically efficient than optimal barrier-function-based methods but provides near-identical results. This is demonstrated through simulation and experimental lithography},
keywords = {},
pubstate = {published},
tppubtype = {article}
}
Scanning laser lithography is a maskless method for exposing photoresist during semiconductor manufacturing. In this method, the energy of a focused beam is controlled while scanning the beam or substrate. With a positive photoresist material, areas that receive an exposure dosage over the threshold energy are dissolved during development. The surface dosage is related to the exposure profile by a convolution and nonlinear function, so the optimal exposure profile is nontrivial. A gradient-based optimization method for determining an optimal exposure profile, given the desired pattern and models of the beam profile and photochemistry, is described. This approach is more numerically efficient than optimal barrier-function-based methods but provides near-identical results. This is demonstrated through simulation and experimental lithography |
2. |  | A. J. Fleming; A. G. Wills; O. T. Ghalehbeygi; B. S. Routley; B. Ninness A Nonlinear Programming Approach to Exposure Optimization in Scanning Laser Lithography Inproceedings American Control Conference, Boston, MA, 2016. BibTeX @inproceedings{C16d,
title = {A Nonlinear Programming Approach to Exposure Optimization in Scanning Laser Lithography},
author = {A. J. Fleming and A. G. Wills and O. T. Ghalehbeygi and B. S. Routley and B. Ninness},
year = {2016},
date = {2016-07-01},
booktitle = {American Control Conference},
address = {Boston, MA},
keywords = {},
pubstate = {published},
tppubtype = {inproceedings}
}
|
1. |  | O. T. Ghalehbeygi; G. Berriman; A. J. Fleming; J. L. Holdsworth Optimization and Simulation of Exposure Pattern for Scanning Laser Lithography Inproceedings IEEE Multiconference on Systems and Control, Sydney, 2015. BibTeX @inproceedings{C15d,
title = {Optimization and Simulation of Exposure Pattern for Scanning Laser Lithography},
author = {O. T. Ghalehbeygi and G. Berriman and A. J. Fleming and J. L. Holdsworth},
year = {2015},
date = {2015-12-01},
booktitle = {IEEE Multiconference on Systems and Control},
address = {Sydney},
keywords = {},
pubstate = {published},
tppubtype = {inproceedings}
}
|