Contact Details

Omid Tayefeh Ghalehbeygi

Precision Mechatronics Lab
School of Electrical Engineering and Computer Science
The University of Newcastle
Callaghan, NSW 2308, Australia
+61 2 4921 7463

Omid(dot)Tayefeh(at)gmail.com

Biography

Omid Tayefeh Ghalehbeygi received his bachelor degree in electrical engineering from Urmia University, Iran in 2008. He received his M.Sc degree in electrical and telecommunication from Istanbul Technical University (ITU), Turkey in 2013, which was collaborated with the Universite Catholique de Louvain (UCL), Belgium. Mr Ghalebeygi is interested in probe-based lithography and computer modelling and optimisation. Currently, He is completing a PhD with the School of Electrical Engineering and Computing with a specialisation in scan-based and near-field lithography.

2019

5.Scanning Laser Lithography with Constrained Quadratic Exposure Optimization

A. J. Fleming; O. T. Ghalehbeygi; B. S. Routley; A. G. Wills

Scanning Laser Lithography with Constrained Quadratic Exposure Optimization Journal Article

IEEE Transactions on Control Systems Technology, 27 (5), pp. 2221-2228, 2019, ISBN: 1063-6536.

Abstract | Links | BibTeX

2018

4.Iterative Deconvolution for Exposure Planning in Scanning Laser Lithography

O. T. Ghalehbeygi; J. O'Connor; B. S. Routley; A. J. Fleming

Iterative Deconvolution for Exposure Planning in Scanning Laser Lithography Inproceedings

American Control Conference, Milwaukee, WI, 2018.

Abstract | BibTeX

2017

3.Gradient-based optimization for efficient exposure planning in maskless lithography

O. T. Ghalehbeygi; A. G. Wills; B. S. Routley; A. J. Fleming

Gradient-based optimization for efficient exposure planning in maskless lithography Journal Article

Journal of Micro/Nanolithography, MEMS, and MOEMS, 16 (3), pp. 033507, 2017.

Abstract | Links | BibTeX

2016

2.A Nonlinear Programming Approach to Exposure Optimization in Scanning Laser Lithography

A. J. Fleming; A. G. Wills; O. T. Ghalehbeygi; B. S. Routley; B. Ninness

A Nonlinear Programming Approach to Exposure Optimization in Scanning Laser Lithography Inproceedings

American Control Conference, Boston, MA, 2016.

BibTeX

2015

1.Optimization and Simulation of Exposure Pattern for Scanning Laser Lithography

O. T. Ghalehbeygi; G. Berriman; A. J. Fleming; J. L. Holdsworth

Optimization and Simulation of Exposure Pattern for Scanning Laser Lithography Inproceedings

IEEE Multiconference on Systems and Control, Sydney, 2015.

BibTeX