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2018

7.Scanning Laser Lithography with Constrained Quadratic Exposure Optimization

A. J. Fleming, O. T. Ghalehbeygi, Ben S. Routley, A. G. Wills

Scanning Laser Lithography with Constrained Quadratic Exposure Optimization (Journal Article)

IEEE Transactions on Control Systems Technology, (In Press) , 2018, ISBN: 1063-6536.

(Abstract | Links | BibTeX | Tags: Lithography)

6.Iterative Deconvolution for Exposure Planning in Scanning Laser Lithography

O. T. Ghalehbeygi, J. O'Connor, B. S. Routley, A. J. Fleming

Iterative Deconvolution for Exposure Planning in Scanning Laser Lithography (Inproceeding)

American Control Conference, Milwaukee, WI, 2018.

(Abstract | BibTeX | Tags: Lithography)

2017

5.Gradient-based optimization for efficient exposure planning in maskless lithography

O. T. Ghalehbeygi, A. G. Wills, B. S. Routley, A. J. Fleming

Gradient-based optimization for efficient exposure planning in maskless lithography (Journal Article)

Journal of Micro/Nanolithography, MEMS, and MOEMS, 16 (3), pp. 033507, 2017.

(Abstract | Links | BibTeX | Tags: Lithography)

2016

4.Exposure Optimization in Scanning Laser Lithography

A. J. Fleming, A. G. Wills, B. S. Routley

Exposure Optimization in Scanning Laser Lithography (Journal Article)

IEEE Potentials, 35 (4), pp. 33-39, 2016, ISSN: 0278-6648.

(Links | BibTeX | Tags: Lithography)

3.A Nonlinear Programming Approach to Exposure Optimization in Scanning Laser Lithography

A. J. Fleming, A. G. Wills, O. T. Ghalehbeygi, B. S. Routley, B. Ninness

A Nonlinear Programming Approach to Exposure Optimization in Scanning Laser Lithography (Inproceeding)

American Control Conference, Boston, MA, 2016.

(BibTeX | Tags: Lithography)

2015

2.Optimization and Simulation of Exposure Pattern for Scanning Laser Lithography

O. T. Ghalehbeygi, G. Berriman, A. J. Fleming, J. L. Holdsworth

Optimization and Simulation of Exposure Pattern for Scanning Laser Lithography (Inproceeding)

IEEE Multiconference on Systems and Control, Sydney, 2015.

(BibTeX | Tags: Lithography, Optics)

1.Optimization of near-field scanning optical lithography

B. S. Routley, J. L. Holdsworth, A. J. Fleming

Optimization of near-field scanning optical lithography (Inproceeding)

Proc. SPIE Advanced Lithography, San Jose, CA, 2015.

(Links | BibTeX | Tags: Lithography)